Product
NEMST-2002ILT 系列
In-line Plasma Cleaner (Tray Type)
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- By employing high frequency RF power supply and unique plasma electrodes design, high density plasma can be induced.
- Using Ar or O2 as the reaction gases for plasma.
- Cycle Time is about 30 seconds and 2 Jedec trays can be treated in one cycle simultaneously.
- Freindly operating interface for convenient, safe and stable production..
- Can be standalone machine or connect with upstream and downstream tools.
- Multiple Processing Gases (Ar, O2, H2, mixed gas, etc.) capable of achieving the best surface cleaning and treatment effects. Physical, Chemical, or Physical/Chemical Mode Cleaning Method.
- Extremely High Cleaning Uniformity.
- Very Little Gas Consumption.
- Apply to Process before Die-bonding, Wire-bonding or Molding in IC Packaging or LED Packaging Applications.
- Wafer Cleaning.
- Suitable for Flip-Chip, PBGA, Window-BGA, Mini-BGA, Micro-BGA, QFN/MLP, TFBGA (Film-BGA), LFBGA, VBGA (EBGA), Pin BGA, QFN/MLP, TCP, PCB, COB, Cu L/F, Ag-Plating L/F, Fe L/F, MMC, SD, Micro-SD, etc. Suitable for Surface Treatment (Cleaning, Modification) for Electronics or Non-electronics Devices/Components.